193nm immersion lithography

2007年3月22日 — Immersion lithography is a lithography enhancement technique that replaces the usual air gap between the final lens element and the photoresist ...

Immersion lithography uses this principle and achieves a higher resolving power by filling the space between the projection lens and the wafer with purified ...

2022年10月26日 — Immersion lithography derives from immersion microscopy. It is an old technique that dates back to the 1840s, when microscoper Giovanni Battista ...

2024年4月30日 — In semiconductor manufacturing, immersion lithography creates smaller and more intricate features on wafers. It enhances the resolution and ...

2023年8月2日 — Multi-patterning and the ultimate immersion platform. While immersion lithography resulted in significant resolution gains, Moore's Law ...

Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process.

由 林育詩 著作 · 2008 — Thus, the immersion technique is being used in modern lithography for the 65-, 45-, and 32-nm nodes. Key words: Immersion lithography, Semiconductor ...